The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

Jun. 20, 2023
Applicant:

Nanjing Tech University, Jiangsu, CN;

Inventors:

Gongping Liu, Jiangsu, CN;

Jiangying Liu, Jiangsu, CN;

Wanqin Jin, Jiangsu, CN;

Yang Pan, Jiangsu, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/22 (2006.01); B01D 67/00 (2006.01); B01D 69/12 (2006.01); B01D 71/52 (2006.01); B01D 71/56 (2006.01); B01D 71/70 (2006.01); B01D 71/80 (2006.01); B01J 20/26 (2006.01); B01J 20/28 (2006.01); B01J 20/30 (2006.01); C08G 77/46 (2006.01);
U.S. Cl.
CPC ...
B01D 71/80 (2013.01); B01D 53/228 (2013.01); B01D 67/0006 (2013.01); B01D 67/0011 (2013.01); B01D 67/0013 (2013.01); B01D 67/009 (2013.01); B01D 69/1214 (2022.08); B01D 71/5211 (2022.08); B01D 71/56 (2013.01); B01D 71/701 (2022.08); B01J 20/267 (2013.01); B01J 20/28035 (2013.01); B01J 20/3085 (2013.01); C08G 77/46 (2013.01); B01D 2323/219 (2022.08); B01D 2323/30 (2013.01);
Abstract

The present disclosure relates to a polyether block polyamide/polydimethylsiloxane (PDMS) composite membrane for gas separation, and a preparation method and use thereof, and belongs to the technical field of membrane separation. In the present disclosure, an amphoteric copolymer PDMS-polyethylene oxide (PEO) (PDMS-b-PEO) is introduced into an intermediate layer to adjust the interfacial binding performance, thereby promoting preparation of an ultra-thin polyether block polyamide composite membrane. Studies have shown that the surface enrichment of PEO segments not only inhibits a dense SiOlayer formed due to a plasma treatment of a PDMS intermediate layer, but also provides additional hydrophilic sites and interfacial compatibility for the subsequent selective layer. The use of PDMS-b-PEO in an intermediate layer allows the successful preparation of a selective layer with a thickness of about 50 nm.


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