The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2024

Filed:

Jul. 12, 2022
Applicant:

Alexander Chieruen Tsuei, Woodbury, MN (US);

Inventors:

Alexander Chieruen Tsuei, Woodbury, MN (US);

Angie Carol Tsuei, Woodbury, MN (US);

Feng-Yi Tsuei, Woodbury, MN (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A41D 13/11 (2006.01);
U.S. Cl.
CPC ...
A41D 13/1161 (2013.01);
Abstract

A face mask and a method for manufacturing the face mask are disclosed. The face mask comprises a sheet, a first lateral flap, a second lateral flap, a first loop, a second loop and an elastic film. The sheet comprises a central portion, a first lateral portion, a second lateral portion and an opening. The first lateral flap is coupled to the first lateral portion to form a first chamber. The second lateral flap is coupled to the second lateral portion to form a second chamber. The first loop connects to a first strap and is coupled to the first lateral flap. The second loop connects to a second strap and is coupled to the second lateral flap. The elastic film is coupled to the sheet and covers the opening.


Find Patent Forward Citations

Tsuei, Alexander. (2024). Face mask and method for manufacturing thereof (U.S. Patent No. 11944138). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11944138

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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