The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2024

Filed:

Jan. 27, 2022
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi, JP;

Inventors:

Yasuharu Hosaka, Tochigi, JP;

Yukinori Shima, Gunma, JP;

Masataka Nakada, Tochigi, JP;

Masami Jintyou, Tochigi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/12 (2006.01); H01L 21/426 (2006.01); H01L 27/12 (2006.01); H01L 29/04 (2006.01); H01L 29/423 (2006.01); H01L 29/49 (2006.01); H01L 29/66 (2006.01); H01L 29/786 (2006.01); G02F 1/1368 (2006.01); H10K 50/115 (2023.01); H10K 59/12 (2023.01); H10K 59/40 (2023.01);
U.S. Cl.
CPC ...
H01L 29/7869 (2013.01); H01L 29/04 (2013.01); H01L 29/423 (2013.01); H01L 29/42384 (2013.01); H01L 29/49 (2013.01); H01L 29/4908 (2013.01); H01L 29/66969 (2013.01); H01L 29/78633 (2013.01); H01L 29/78648 (2013.01); G02F 1/1368 (2013.01); H01L 21/426 (2013.01); H01L 27/1225 (2013.01); H10K 50/115 (2023.02); H10K 59/12 (2023.02); H10K 59/40 (2023.02);
Abstract

In a transistor that includes an oxide semiconductor, a change in electrical characteristics is suppressed and the reliability is improved. A semiconductor device that includes a transistor is provided. The transistor includes a first conductive film that functions as a first gate electrode, a first gate insulating film, a first oxide semiconductor film that includes a channel region, a second gate insulating film, and a second oxide semiconductor film and a second conductive film that function as a second gate electrode. The second oxide semiconductor film includes a region higher in carrier density than the first oxide semiconductor film. The second conductive film includes a region in contact with the first conductive film.


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