The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2024
Filed:
Dec. 05, 2019
Applicant:
Oerlikon Surface Solutions Ag, Pfäffikon, Pfäffikon, CH;
Inventor:
Jörg Vetter, Bergisch Gladbach, DE;
Assignee:
OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON, Pfäffikon, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32669 (2013.01); C23C 14/325 (2013.01); H01J 37/32055 (2013.01); H01J 37/32568 (2013.01); H01J 37/32651 (2013.01); H01J 37/34 (2013.01);
Abstract
In order to improve the etching depth and/or the etching homogeneity at a substrate, a plasma source with one or more single electrodes or one or more magnets is proposed. The magnet generates a magnetic field in the vicinity of the electrodes, which may be rear-side or front-side.
Vetter, Jörg. (2024). Magnet arrangement for a plasma source for performing plasma treatments (U.S. Patent No. 11942311). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11942311
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile