The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2024

Filed:

Oct. 07, 2021
Applicant:

Meta Platforms Technologies, Llc, Menlo Park, CA (US);

Inventors:

Niv Kantor, Redwood City, CA (US);

Ricardo Garcia, San Bruno, CA (US);

Nadav Grossinger, Hillsborough, CA (US);

Robert Hasbun, San Jose, CA (US);

Nitay Romano, Nitzan, IL;

Assignee:

Meta Platforms Technologies, LLC, Menlo Park, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/521 (2017.01); G01S 17/48 (2006.01);
U.S. Cl.
CPC ...
G06T 7/521 (2017.01); G01S 17/48 (2013.01); G06T 2207/10028 (2013.01);
Abstract

In one embodiment, a system includes at least one projector configured to project a plurality of projected patterns, where a projected lighting characteristic of each of the projected patterns varies over a time period in accordance with an associated predetermined temporal lighting-characteristic pattern, a camera configured to capture images of detected patterns during the time period, and one or more processors configured to: determine, for each detected pattern, a detected temporal lighting-characteristic pattern based on variations in a detected lighting characteristic of the detected pattern, identify a detected pattern that corresponds to one of the projected patterns by comparing at least one of the detected temporal lighting-characteristic patterns to at least one of the temporal lighting-characteristic patterns, and compute a depth associated with the detected patterns based on the one or more of the projected patterns, the detected pattern, and a relative position between the camera and the projector.


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