The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2024

Filed:

Dec. 30, 2020
Applicants:

Beijing Wodong Tianjun Information Technology Co., Ltd., Beijing, CN;

Jd.com American Technologies Corporation, Mountain View, CA (US);

Inventors:

Xiaochuan Fan, Milpitas, CA (US);

Dan Miao, San Jose, CA (US);

Chumeng Lyu, Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 19/20 (2011.01); G06N 3/045 (2023.01); G06N 3/08 (2023.01); G06N 20/00 (2019.01); G06T 7/00 (2017.01); G06T 7/55 (2017.01); G06T 15/20 (2011.01); G06T 17/00 (2006.01); G06T 19/00 (2011.01);
U.S. Cl.
CPC ...
G06T 19/20 (2013.01); G06N 3/045 (2023.01); G06N 3/08 (2013.01); G06N 20/00 (2019.01); G06T 7/55 (2017.01); G06T 7/97 (2017.01); G06T 15/205 (2013.01); G06T 17/00 (2013.01); G06T 19/00 (2013.01);
Abstract

A method and a system for garment try-on. The method includes: capturing a three dimensional (3D) image of a customer; obtaining first 3D pose of the customer in the 3D image; performing a machine learning model on the 3D pose to generate a first skinned multi-person linear model (SMPL) pose; calculating an angle of the whole body rotation of the customer based on the first SMPL pose; when the angle is in a predefined range relative to a front direction of the customer: constructing an SMPL model using the first SMPL pose; and when the angle is out of the predefined range: generating a second SMPL pose using two dimensional (2D) component of the 3D image, and constructing the SMPL model using the second SMPL pose.


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