The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2024
Filed:
Dec. 03, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Sanjay Bhat, Singapore, SG;
Vibhu Jindal, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/20 (2012.01); G03F 7/00 (2006.01); G03F 7/09 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 1/20 (2013.01); G03F 7/09 (2013.01); G03F 7/70283 (2013.01); G03F 7/70716 (2013.01); G03F 7/70741 (2013.01); G03F 9/7096 (2013.01);
Abstract
Provided herein are apparatus, systems and methods for processing reticle blanks. A reticle processing system includes a support assembly having a plate coupled to a frame, and a carrier base assembly supported on the support assembly. The carrier base assembly comprises a wall extending from a top surface of the carrier base and defining a containment region for a reticle.