The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2024
Filed:
Mar. 02, 2023
Applicant:
Jx Metals Corporation, Tokyo, JP;
Inventors:
Assignee:
JX Metals Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/706 (2006.01); C04B 35/01 (2006.01); C22C 19/07 (2006.01); C23C 14/08 (2006.01); C23C 14/14 (2006.01); C23C 14/34 (2006.01); G11B 5/65 (2006.01); H01F 1/10 (2006.01); H01F 41/18 (2006.01); H01J 37/34 (2006.01); C22C 1/04 (2023.01); C22C 32/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C04B 35/01 (2013.01); C22C 19/07 (2013.01); C23C 14/08 (2013.01); C23C 14/14 (2013.01); G11B 5/658 (2021.05); G11B 5/70605 (2013.01); H01F 1/10 (2013.01); H01F 41/18 (2013.01); H01J 37/3426 (2013.01); C04B 2235/405 (2013.01); C04B 2235/408 (2013.01); C22C 1/04 (2013.01); C22C 32/00 (2013.01);
Abstract
Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.