The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2024

Filed:

Apr. 06, 2022
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Isao Miyatani, Tokyo, JP;

Chikao Ikenaga, Tokyo, JP;

Yoko Nakamura, Tokyo, JP;

Isao Inoue, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01);
Abstract

A deposition mask according to an embodiment of the present disclosure includes a first surface, a second surface that is located opposite the first surface, and two or more through-holes. Each of the through-holes includes a first recess that is located at the first surface and a second recess that is located at the second surface. The deposition mask has a first mask region having a first surface remaining ratio that represents a remaining area ratio of the second surface and a second mask region having a second surface remaining ratio that represents a remaining area ratio of the second surface and that is higher than the first surface remaining ratio.


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