The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2024
Filed:
May. 06, 2021
International Business Machines Corporation, Armonk, NY (US);
Theodorus E. Standaert, Clifton Park, NY (US);
Daniel Charles Edelstein, White Plains, NY (US);
Chih-Chao Yang, Glenmont, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A semiconductor structure forms two or more tightly pitched memory devices using a dielectric material for a gap fill material. The approach includes providing two adjacent bottom electrodes in a layer of an insulating material and above a metal layer. Two adjacent pillars are each above one of the two adjacent bottom electrodes where each pillar of the two adjacent pillars is composed of a stack of materials for a memory device. A spacer is around the vertical sides each of the two adjacent pillars. The dielectric material is on the spacer around the vertical sides each of the two adjacent pillars, on the layer of the insulating material between the two adjacent bottom electrodes. The dielectric material fills at least a first portion of a gap between the two adjacent pillars. A low k material covers the dielectric material and exposed portions of the layer of the insulating material.