The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2024
Filed:
Dec. 10, 2021
Nvidia Corporation, Santa Clara, CA (US);
Maksim Aizenshtein, Sammamish, WA (US);
NVIDIA Corporation, Santa Clara, CA (US);
Abstract
Systems and methods are provided to perform constrained BSDF sampling in relation to various algorithms, and specifically in relation to ray tracing algorithms. In some embodiments, a method is provided to generate samples by: determining a spherical polygon on a unit hemisphere; determining, on a unit circle, a projected area corresponding to the spherical polygon on the unit hemisphere; determining a parameterization of the projected area of the spherical polygon on the unit circle; generating samples in the projected area based on the parameterization; and generating samples in the spherical polygon. The unit circle is abase of the unit hemisphere, and the projection of the projected area is along a vector perpendicular to the unit circle. The generated samples in the spherical polygon correspond to the samples in the projected area. The method may further include evaluating a rendering equation based on the generated samples in the spherical polygon.