The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2024
Filed:
Jun. 15, 2021
Applicant:
Nvidia Corporation, Santa Clara, CA (US);
Inventors:
Yaobin Ouyang, Shanghai, CN;
Nan Lin, Shanghai, CN;
Jacopo Pantaleoni, Berlin, DE;
Markus Kettunen, Urdorf, CH;
Shiqiu Liu, Santa Clara, CA (US);
Assignee:
Nvidia Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/06 (2011.01); G06T 15/50 (2011.01);
U.S. Cl.
CPC ...
G06T 15/06 (2013.01); G06T 15/506 (2013.01);
Abstract
Disclosed are apparatuses, systems, and techniques to render images with global illumination using efficient ray tracing, light source identification, and reservoir resampling that deploys temporal and spatial reservoirs.
Quick Actions:
Ouyang, Yaobin. (2024). Ray tracing using reservoir resampling with spatial shift-mapping (U.S. Patent No. 11935177). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11935177
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