The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2024
Filed:
Jun. 24, 2021
Applicant:
The Regents of the University of Michigan, Ann Arbor, MI (US);
Assignee:
THE REGENTS OF THE UNIVERSITY OF MICHIGAN, Ann Arbor, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/00 (2006.01); G02B 27/42 (2006.01);
U.S. Cl.
CPC ...
G02B 1/002 (2013.01); G02B 27/42 (2013.01); G02B 2207/101 (2013.01);
Abstract
A metalens configured to shape the focus light into a flexibly designed pattern. The present teachings demonstrate the engineering of metalens with artificial focus pattern by creating line and ring-shaped focus as 'drawing tools'. These metalens are fabricated through a single layer of silicon-based material through CMOS compatible nano fabrication process. The mechanism to generate artificial focus pattern can be applied to a plethora of future on-chip optical devices with applications ranging from beam engineering to next generation nano lithography.