The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2024

Filed:

Sep. 25, 2020
Applicant:

National University of Defense Technology, Hunan, CN;

Inventors:

Xiaokang Li, Hunan, CN;

Mousen Cheng, Hunan, CN;

Jianjun Wu, Hunan, CN;

Bixuan Che, Hunan, CN;

Moge Wang, Hunan, CN;

Dawei Guo, Hunan, CN;

Xiong Yang, Hunan, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F03H 1/00 (2006.01);
U.S. Cl.
CPC ...
F03H 1/0081 (2013.01); F03H 1/0006 (2013.01);
Abstract

An inductive plasma acceleration apparatus, comprising a pulse laser assembly, a pulsed discharge assembly, an exciting coil assembly, a solid-state working medium, and a control assembly; the exciting coil assembly is electrically connected to the pulsed discharge assembly such that a strong pulse current is produced in the exciting coil assembly during the discharge process of the pulse discharge assembly, and an inductive pulse electromagnetic field is excited around the exciting coil assembly; the solid-state working medium is positioned on the optical path of a pulse laser emitted by the pulse laser assembly such that the solid-state working medium produces a pulse gas under the ablation action of the pulse laser, and the inductive pulse electromagnetic field is positioned on the circulation gas path of the pulse gas such that the pulse gas can enter the inductive pulse electromagnetic field.


Find Patent Forward Citations

Loading…