The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2024

Filed:

Aug. 31, 2022
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Akihiko Tsunoya, Okaya, JP;

Koji Fujimori, Matsumoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/245 (2017.01); B29C 64/20 (2017.01); B29C 64/209 (2017.01); B33Y 30/00 (2015.01); B29C 64/118 (2017.01);
U.S. Cl.
CPC ...
B29C 64/245 (2017.08); B29C 64/20 (2017.08); B29C 64/209 (2017.08); B33Y 30/00 (2014.12);
Abstract

A three-dimensional shaping device includes: a stage whose shaping surface has a first groove and a second groove extending in a first direction; a discharge unit configured to supply a shaping material to the shaping surface; a movement mechanism configured to relatively move the stage and the discharge unit; and a control unit configured to control the discharge unit and the movement mechanism. The control unit is configured to control the movement mechanism and the discharge unit to: form a first girder layer by supplying the shaping material to the first groove while relatively moving the discharge unit in the first direction with respect to the stage, form a second girder layer by supplying the shaping material to the second groove while relatively moving the discharge unit in the first direction with respect to the stage, and form a first floor layer coupling the first girder layer and the second girder layer by supplying the shaping material to the shaping surface while relatively moving the discharge unit with respect to the stage.


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