The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2024

Filed:

Oct. 28, 2021
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Hans Weber, Bayerisch Gmain, DE;

Ingo Muri, Villach, AT;

Maximilian Treiber, Munich, DE;

Daniel Tutuc, St. Niklas an der Drau, AT;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/265 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0634 (2013.01); H01L 21/26586 (2013.01); H01L 29/66712 (2013.01); H01L 29/7802 (2013.01); H01L 29/7811 (2013.01); H01L 29/0623 (2013.01);
Abstract

A method and a transistor device are disclosed. The transistor device includes: a semiconductor body; first regions of a first doping type and second regions of a second doping type in an inner region and an edge region of the semiconductor body; transistor cells in the inner region of the semiconductor body, each transistor cell including a body region and a source region, the transistor cells including a common drain region; and a buffer region arranged between the drain region and the first and second regions. A dopant dose in the first and second regions decreases towards an edge surface of the semiconductor body. A dopant dose in the buffer region decreases towards the edge surface.


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