The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2024
Filed:
May. 22, 2023
City University of Hong Kong, Kowloon, HK;
Kwok Wa Leung, Kowloon, HK;
Wai Ki Lee, Yuen Long, HK;
Abstract
A Far-UVC excimer light source contains a first electrode adapted to be energized, a second electrode adapted to be energized, a body defining a cavity that is filled with an excited molecule complex between the first and second electrodes; and a Far-UVC optical dielectric coating filter which is a Far-UVC filter attached to the interior side of the first electrode and adapted to filter a Far-UVC light excited in the cavity of the body. The Far-UVC dielectric coating is located inside the light source, between the cavity with the excited molecules and the first electrode. The Far-UVC filter attached to the interior side of the first electrode is a transmissive Far-UVC optical filtering dielectric coating or coated glass which is integrated, placed on, or near the interior side of the first electrode inside the light source.