The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2024
Filed:
Oct. 13, 2021
International Business Machines Corporation, Armonk, NY (US);
Clement Decrop, Arlington, VA (US);
Craig M. Trim, Ventura, CA (US);
Jeremy R. Fox, Georgetown, TX (US);
Fang Lu, Billerica, MA (US);
Uri Kartoun, Cambridge, MA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Systems, methods, and computer programming products for dynamically managing the uninstallation and/or re-installation of software applications stored or accessed by a computing system, including mobile devices. Management of the applications by the system can be periodically managed automatically or based on recommendations. Management of applications being uninstalled or reinstalled may be determined based on a rate a user accesses the application and/or data published or accessible by an application storefront, such as user reviews, storefront rankings, user feedback and uninstallation rates of the applications by other users. Applications experiencing a decreased level of average user satisfaction below a predetermined threshold can be proposed for deletion or automatically deleted. Replacement of underperforming or unsatisfactory applications with alternative applications having similar functionality but a higher rate of user satisfaction can be recommended or installed. Previously uninstalled applications can be recommended or automatically reinstalled upon average user satisfaction rising above configured threshold levels.