The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2024
Filed:
May. 31, 2022
Applicant:
National Chung Shan Institute of Science and Technology, Taoyuan, TW;
Inventors:
Jian-Hung Lin, Taoyuan, TW;
Chiang-Hsin Lin, Taoyuan, TW;
Po-Tse Tai, Taoyuan, TW;
Tsong-Dong Wang, Taoyuan, TW;
Bo-Kai Feng, Taoyuan, TW;
Assignee:
NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY, Taoyuan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/28 (2006.01); G02B 5/18 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1809 (2013.01); G02B 5/1857 (2013.01); G02B 5/285 (2013.01);
Abstract
A dielectric grating apparatus comprises a substrate; a grating layer, disposed above the substrate; a first interference layer, disposed above the substrate; and a second interference layer, adjacent to the first interference layer, wherein a refractive index of a material of the second interference layer is greater than a refractive index of a material of the first interference layer.