The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2024
Filed:
Apr. 29, 2022
Andritz (China) Ltd., Guangdong, CN;
Alexander Gscheider, Hohentauern, AT;
ANDRITZ (China) Ltd., Guangdong, CN;
Abstract
A method for dilution for a pressure screen comprising a rotor rotating inside a screen a distance to the screen, includes supplying feeding stock into a screening zone formed in the spacing between the rotor and the screen with some of the feeding stock passing through the screen into an accept area to become accept, and the remaining feeding stock discharged into a reject area as reject flow. The amount of the dilution water added into the reject flow is 0.8 to 3.5 times the amount of the reject flow by volume. Additionally, a pressure screen comprises a dilution water adding apparatus adapted to add dilution water directly into the reject area of the pressure screen, wherein the amount of the dilution water added into the reject flow is 0.8 to 3.5 times of the amount of the reject flow by volume.