The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2024

Filed:

Dec. 07, 2018
Applicant:

Fujifilm Electronic Materials U.s.a., Inc., N. Kingstown, RI (US);

Inventors:

Shih-Pin Chou, Hsinchu, TW;

Wen-Hung Chang, Gilbert, AZ (US);

Deepak Mahulikar, Leander, TX (US);

Tamas Varga, Mesa, AZ (US);

Abhudaya Mishra, Gilbert, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01F 33/84 (2022.01); B01F 23/40 (2022.01); B01F 23/45 (2022.01); B01F 23/50 (2022.01); B01F 23/53 (2022.01); B01F 23/80 (2022.01); B01F 25/50 (2022.01); B01F 27/191 (2022.01); B01F 35/21 (2022.01); B01F 35/22 (2022.01); B01F 35/71 (2022.01); B01F 101/27 (2022.01); B24B 57/00 (2006.01); B24B 57/02 (2006.01); C09G 1/02 (2006.01);
U.S. Cl.
CPC ...
B01F 33/84 (2022.01); B01F 23/45 (2022.01); B01F 23/49 (2022.01); B01F 23/511 (2022.01); B01F 23/53 (2022.01); B01F 23/808 (2022.01); B01F 25/50 (2022.01); B01F 27/191 (2022.01); B01F 35/2117 (2022.01); B01F 35/2132 (2022.01); B01F 35/2133 (2022.01); B01F 35/2202 (2022.01); B01F 35/71 (2022.01); B01F 35/711 (2022.01); B01F 35/712 (2022.01); B24B 57/00 (2013.01); B24B 57/02 (2013.01); C09G 1/02 (2013.01); B01F 2101/27 (2022.01);
Abstract

The disclosure features a system that includes a plurality of material tanks, each of which includes at least one material for forming a chemical composition and includes a first recirculation loop; at least one mixing tank in which the materials from the material tanks are mixed to form a chemical composition, the mixing tank including a second recirculation loop; and at least one holding tank configured to continuously receive the chemical composition from the mixing tank, the holding tank including a third recirculation loop. The system may further include a plurality of fluid flow controller units and be configured to form material and chemical composition flows in an in-process steady state.


Find Patent Forward Citations

Loading…