The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Apr. 24, 2019
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventors:
Masashi Okaniwa, Tokyo, JP;
Takenori Takiguchi, Tokyo, JP;
Kohei Higashiguchi, Tokyo, JP;
Tsuyoshi Kida, Tokyo, JP;
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 5/29 (2006.01); B32B 27/28 (2006.01); B32B 27/36 (2006.01); C08F 222/40 (2006.01); C08G 73/10 (2006.01); C08K 3/36 (2006.01); C08K 5/14 (2006.01); C08L 79/08 (2006.01); H01L 23/00 (2006.01); H01L 23/29 (2006.01); H05K 3/30 (2006.01);
U.S. Cl.
CPC ...
H05K 3/305 (2013.01); B32B 27/281 (2013.01); B32B 27/36 (2013.01); C08F 222/40 (2013.01); C08F 222/404 (2020.02); C08G 73/1046 (2013.01); C08K 3/36 (2013.01); C08K 5/14 (2013.01); C08K 5/29 (2013.01); C08L 79/085 (2013.01); H01L 23/295 (2013.01); H01L 24/29 (2013.01); C08K 2201/003 (2013.01); C09J 2203/326 (2013.01); H01L 2224/2919 (2013.01); H01L 2224/2929 (2013.01); H01L 2924/0635 (2013.01); H01L 2924/07025 (2013.01);
Abstract
A resin composition that has both excellent flux activity and high insulation reliability, that possesses good storage stability, and that further has flexibility with good operability upon being used as a laminate is provided. The resin composition contains a chelating flux agent (A), a thermal radical polymerization initiator (B) and a radical polymerizable compound (C).