The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2024

Filed:

Jun. 26, 2020
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Youngseop Choi, Cheonan-si, KR;

Young Hun Lee, Cheonan-si, KR;

Yong-Jun Seo, Hwaseong-si, KR;

Bok Kyu Lee, Cheonan-si, KR;

Miso Park, Daejeon, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/08 (2006.01); B08B 7/04 (2006.01); B08B 13/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67248 (2013.01); B08B 3/08 (2013.01); B08B 7/04 (2013.01); B08B 13/00 (2013.01); H01L 21/67051 (2013.01); H01L 21/67103 (2013.01); H01L 21/6719 (2013.01);
Abstract

The inventive concept relates to an apparatus for treating a substrate. In an embodiment, the apparatus includes a process chamber having a process space in which the substrate is treated with a fluid in a supercritical state, a support unit that supports the substrate in the process space, a fluid supply unit that supplies the fluid into the process space, a filler member disposed to face the substrate placed on the support unit in the process space, and a measurement unit that measures a state in the process space, the measurement unit being provided in the filler member.


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