The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Oct. 16, 2020
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Assignee:
Semes Co., Ltd., Cheonan-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); F27B 17/00 (2006.01); F27D 5/00 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01); H01L 21/3105 (2006.01); H01L 21/66 (2006.01); H05B 3/22 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67109 (2013.01); F27B 17/0025 (2013.01); F27B 17/0083 (2013.01); F27D 5/0037 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); H01L 21/0273 (2013.01); H01L 21/31058 (2013.01); H01L 21/67253 (2013.01); H01L 22/26 (2013.01); H05B 3/22 (2013.01);
Abstract
An apparatus for treating a substrate includes a process chamber having a process space inside, a support unit that supports the substrate in the process space, a heating unit that is provided inside the support unit and that heats the substrate, an exhaust unit that evacuates the process space, and a gas supply unit that supplies a gas into the process space, and the gas supply unit supplies the gas at a temperature selected from a first temperature and a second temperature.