The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Aug. 11, 2020
National Institute of Advanced Industrial Science and Technology, Tokyo, JP;
Rikio Soda, Aichi, JP;
Kimihiro Ozaki, Aichi, JP;
Abstract
An orientation degree distribution analysis method includes steps of: inputting, to a main storage device, crystal structure information of an object to be measured, information on an intensity ratio of each diffraction peak and a crystal plane corresponding to each diffraction peak by X-ray diffraction measurement, information on a diffraction range and a diffraction sensitivity, and information on an intensity ratio of each diffraction peak of a randomly oriented sample; calculating an angle defined by an orientation plane and a crystal plane corresponding to a diffraction peak of interest from the information stored in the main storage device; calculating an existence ratio and storing the existence ratio in the main storage device; setting an orientation degree distribution function; and calculating an orientation degree distribution from the information of the inputting step and the information of the calculating step.