The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2024

Filed:

Aug. 31, 2021
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventors:

Hiroshi Hamasaki, Hiratsuka Kanagawa, JP;

Yoshiaki Sugizaki, Fujisawa Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 33/68 (2006.01); A01N 1/02 (2006.01); B01L 3/00 (2006.01); C07C 309/65 (2006.01); C07C 309/73 (2006.01); G01N 1/40 (2006.01); G01N 21/33 (2006.01); G01N 21/64 (2006.01); G01N 27/414 (2006.01); G01N 33/52 (2006.01); G01N 33/532 (2006.01); G01N 33/543 (2006.01); G01N 33/569 (2006.01); G01N 33/72 (2006.01);
U.S. Cl.
CPC ...
G01N 1/4077 (2013.01); G01N 27/4141 (2013.01);
Abstract

A gas concentration device includes a first container, a second container, a pressure control device, and a path. The first container includes a first space surrounded by a first partition wall and stores a specimen, and a pressure inside the first space is reduced. The second container is airtightly connected to the first container by a first path and has a second space surrounded by a second partition wall and stores a gas flowing in from the first space. The pressure control device reduces a volume of the second space. A gas inside the second space is discharged through a second path.


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