The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2024

Filed:

Oct. 01, 2021
Applicant:

Duk San Neolux Co., Ltd., Cheonan-si, KR;

Inventors:

Changmin Lee, Cheonan-si, KR;

Yun Jong Ko, Cheonan-si, KR;

Jun Bae, Cheonan-si, KR;

Jun Ki Kim, Cheonan-si, KR;

Hyunsang Cho, Cheonan-si, KR;

Seo Jeong Jeon, Cheonan-si, KR;

Soung Yun Mun, Cheonan-si, KR;

Assignee:

DUK SAN NEOLUX CO., LTD., Cheonan-si, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08L 35/02 (2006.01); C08F 2/50 (2006.01); C08F 8/42 (2006.01); C08F 222/10 (2006.01); C08K 5/00 (2006.01); H10K 85/10 (2023.01); H10K 85/40 (2023.01); H10K 50/80 (2023.01); H10K 71/00 (2023.01); H10K 85/60 (2023.01);
U.S. Cl.
CPC ...
C08L 35/02 (2013.01); C08F 2/50 (2013.01); C08F 8/42 (2013.01); C08F 222/102 (2020.02); C08K 5/0041 (2013.01); H10K 85/111 (2023.02); H10K 85/40 (2023.02); H10K 50/868 (2023.02); H10K 71/00 (2023.02); H10K 85/6572 (2023.02);
Abstract

Provided are a display device including a resin containing a repeating unit represented by chemical formula (1), a resin composition comprising the resin, and a pixel separation unit formed of the resin composition, in which the display device is a display device including a first electrode formed on a substrate, a pixel separation unit formed on the first electrode to partially expose the first electrode, and a second electrode installed to face the first electrode, and the pixel separation unit has an absorbance of 0.5/μm or more at a wavelength of 550 nm.


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