The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Nov. 16, 2018
Applicant:
Hanwha Chemical Corporation, Seoul, KR;
Inventors:
Kwang Seok Jeong, Yongin-si, KR;
Min Sung Kim, Seoul, KR;
Jae Heon Kim, Seongnam-si, KR;
Ju Young Park, Suwon-si, KR;
Cho Hee Ahn, Seoul, KR;
Byeong Hyeon Lee, Seoul, KR;
Sang Hyun Cho, Anyang-si, KR;
Assignee:
HANWHA CHEMICAL CORPORATION, Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G 65/40 (2006.01); C08G 65/46 (2006.01); C08J 3/12 (2006.01); C08K 5/03 (2006.01);
U.S. Cl.
CPC ...
C08G 65/4012 (2013.01); C08G 65/4087 (2013.01); C08G 65/46 (2013.01); C08J 3/12 (2013.01); C08K 5/03 (2013.01); C08G 2650/40 (2013.01);
Abstract
Provided are a method for preparing a polyetherketoneketone and a polyetherketoneketone prepared thereby, wherein, at the time of a polymerization reaction, nitrogen gas is blown into a liquid reaction medium while stirring, thereby quickly removing hydrochloric acid, which is a by-product generated during the reaction, and preventing aggregation of resin particles, thus suppressing the generation of scales.