The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2024

Filed:

Mar. 29, 2022
Applicant:

Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;

Inventors:

Matthias Söhn, Hanau, DE;

Boris Gromann, Hanau, DE;

Eduard Visnow, Hanau, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03B 9/36 (2006.01); C03B 9/38 (2006.01); C03B 11/12 (2006.01); C03B 11/16 (2006.01); C03B 17/04 (2006.01); C03B 23/047 (2006.01); C03B 23/07 (2006.01);
U.S. Cl.
CPC ...
C03B 11/16 (2013.01); C03B 11/127 (2013.01); C03B 23/07 (2013.01); C03B 23/047 (2013.01); C03B 2215/40 (2013.01);
Abstract

In a method of manufacturing a tube of quartz glass by molding a hollow cylinder having a wall thickness of at least 20 mm, the cylinder is continuously fed under rotation about a rotational axis into a heating zone at a relative feed rate V, softened and radially expanded under the effect of a gas pressure. A tube strand is continuously formed and is withdrawn at a withdrawal rate V. In order to mold thick-walled initial hollow cylinders of quartz glass into tubes with larger diameter, the gas pressure is used as an actuating variable of a diameter regulation for the tube outer diameter or for a geometrical correlated parameter thereof, and in a pressure build-up phase the gas pressure is gradually increased from a lower initial value to a higher final value, and that the following applies to the ratio of Vand V:V=V±0.2·V.


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