The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Apr. 16, 2015
Applicant:
Lawrence Livermore National Security, Llc, Livermore, CA (US);
Inventor:
Bryan D. Moran, Pleasanton, CA (US);
Assignee:
Lawrence Livermore National Security, LLC, Livermore, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/135 (2017.01); B29L 9/00 (2006.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/135 (2017.08); B29L 2009/00 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/00 (2014.12);
Abstract
A large area projection micro stereolithography (LAPuSL) system uses an addressable spatial light modulator (SLM) in coordination with an optical scanning system to make very large stereolithographically produced objects. The SLM is imaged onto a photosensitive material with an optical system that has the ability to scan the image over a large area and speedily manufacture large scale complex three dimensional components with micro scale features.