The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Dec. 21, 2021
Applicant:
Formlabs, Inc., Somerville, MA (US);
Inventors:
Benjamin FrantzDale, Harvard, MA (US);
Shane Wighton, Raleigh, NC (US);
Assignee:
Formlabs, Inc., Somerville, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/124 (2017.01); B29C 64/236 (2017.01); B29C 64/245 (2017.01); B29C 64/264 (2017.01); B29C 64/393 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01);
U.S. Cl.
CPC ...
B29C 64/124 (2017.08); B29C 64/236 (2017.08); B29C 64/245 (2017.08); B29C 64/264 (2017.08); B29C 64/393 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12);
Abstract
According to some aspects, techniques are provided to mitigate challenges with additive fabrication devices that utilize a film. These techniques include: improvements to an additive fabrication device build platform to more evenly apply forces onto the film; techniques for inhibiting adhesion between a pair of films and for removing dirt or dust therein; techniques for detecting and/or mitigating the effects of scratches or dust on films; and techniques for detecting film punctures, detecting an imminent film puncture, and/or reducing the impact on the device when punctures occur.