The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Nov. 23, 2020
Zhejiang Wynca Chemical Industry Group Co., Ltd, Zhejiang, CN;
East China University of Science and Technology, Shanghai, CN;
Zhenmin Cheng, Shanghai, CN;
Shengbao Jiang, Zhejiang, CN;
Shenluan Yu, Zhejiang, CN;
Shuguang Zhou, Zhejiang, CN;
Minhai Tu, Zhejiang, CN;
Long Qin, Zhejiang, CN;
Zhichao Jin, Shanghai, CN;
Zibin Huang, Shanghai, CN;
Meichen Chen, Shanghai, CN;
Peiqing Yuan, Shanghai, CN;
ZHEJIANG WYNCA CHEMICAL INDUSTRY GROUP CO., LTD, Zhejiang, CN;
EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY, Shanghai, CN;
Abstract
The present application discloses a multi-region plasma shell-and-tube reactor comprising a shell body. At least two reaction regions are provided inside the shell body, and a horizontal separation panel is provided between any two adjacent reaction regions, used to separate the two and passing through the tubes. A central hole is provided in the center of any horizontal separation panel, and at least one auxiliary hole distributed around the central axis of the central hole is provided in any horizontal separation panel so as to cooperate with the central hole to cause a vortex state to be formed in a reaction region.