The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Apr. 01, 2021
Applicant:
Plasma Electron Cleaning System, Inc. (Pecs), Monterey, CA (US);
Inventor:
Alfred Y. Wong, Los Angeles, CA (US);
Assignee:
Nonlinear Ion Dynamics, LLC, Monterey, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/46 (2006.01); A61L 2/14 (2006.01);
U.S. Cl.
CPC ...
H05H 1/4645 (2021.05); A61L 2/14 (2013.01); H05H 2245/36 (2021.05);
Abstract
Provided are a system and method for sterilizing one or more medium via plasma exposure. The sterilization may be accomplished by exposing a respective medium to a given electrical field generated by electrodes disposed to target such medium, and through, optionally, further application of a magnetic field having a portion thereof disposed orthogonally to the generated electrical field.
Wong, Alfred. (2024). System and method for plasma-electron sterilization (U.S. Patent No. 11917745). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11917745
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile