The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2024

Filed:

Jul. 21, 2022
Applicant:

Nikon Corporation, Tokyo, JP;

Inventors:

Go Ichinose, Fukaya, JP;

Tomonori Dosho, Saitama, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); G01B 21/00 (2006.01); G01B 11/27 (2006.01); G03F 1/42 (2012.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/682 (2013.01); G01B 11/272 (2013.01); G01B 21/00 (2013.01); G03F 1/42 (2013.01); G03F 7/20 (2013.01); G03F 7/26 (2013.01); G03F 7/70775 (2013.01); G03F 9/00 (2013.01); G03F 9/7084 (2013.01); H01L 21/68 (2013.01);
Abstract

A measurement system used in a manufacturing line for micro-devices includes: a plurality of measurement devices in which each device performs measurement processing on a substrate; and a carrying system to perform delivery of a substrate with the plurality of measurement devices. The plurality of measurement devices includes a first measurement device that acquires position information on a plurality of marks formed on a substrate, and a second measurement device that acquires position information on a plurality of marks formed on a substrate. Position information on a plurality of marks formed on a substrate can be acquired under a setting of a first predetermined condition in the first measurement device, and position information on a plurality of marks formed on another substrate can be acquired under a setting of a second predetermined condition different from the first predetermined condition in the second measurement device.


Find Patent Forward Citations

Ichinose, Go. (2024). Measurement system, substrate processing system, and device manufacturing method (U.S. Patent No. 11915961). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11915961

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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