logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11915915 B1

PDFFull Text
Date of Patent:
Feb. 27, 2024

Filed:

May. 28, 2021

Apparatus for generating magnetic fields during semiconductor processing

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Suhas Bangalore Umesh, Sunnyvale, CA (US);

Martin Lee Riker, Milpitas, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:

Moser Taboa

Primary Examiner:

Keath T Chen

Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01F 7/02 (2006.01); C23C 14/54 (2006.01); C23C 14/24 (2006.01); C23C 14/14 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32669 (2013.01); C23C 14/14 (2013.01); C23C 14/24 (2013.01); C23C 14/351 (2013.01); C23C 14/54 (2013.01); H01F 7/02 (2013.01); H01J 37/3266 (2013.01); H01J 2237/332 (2013.01);
Abstract

A plasma vapor deposition (PVD) chamber used for depositing material includes an apparatus for influencing ion trajectories during deposition in an edge region of a substrate. The apparatus includes a reflector assembly that surrounds a substrate support and is configured to reflect heat to the substrate during reflowing of material deposited on the substrate and a plurality of permanent magnets embedded in the reflector assembly that are configured to influence ion trajectories on the edge region of the substrate during deposition processes, the plurality of permanent magnets are spaced symmetrically around the reflector assembly.

Find Patent Forward Citations

Bangalore Umesh, Suhas. (2024). Apparatus for generating magnetic fields during semiconductor processing (U.S. Patent No. 11915915). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11915915

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…