The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2024

Filed:

Feb. 25, 2021
Applicant:

Fhr Anlagenbau Gmbh, Ottendorf-Okrilla, DE;

Inventors:

Sven Häberlein, Ottendorf-Okrilla, DE;

Andreas Vogt, Dresden, DE;

Roland Maudrich, Moritzburg, DE;

Assignee:

FHR ANLAGENBAU GMBH, Ottendorf-Okrilla, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/54 (2006.01); C23C 14/56 (2006.01); H01J 37/34 (2006.01); H01J 37/32 (2006.01); C23C 14/50 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3492 (2013.01); C23C 14/3407 (2013.01); C23C 14/50 (2013.01); C23C 14/54 (2013.01); C23C 14/542 (2013.01); C23C 14/56 (2013.01); H01J 37/32403 (2013.01); H01J 37/3417 (2013.01);
Abstract

A method and a device are provided for homogeneously coating surfaces of 3D substrates in a vacuum chamber which has a sputtering source, such as a planar source or a tube or double-tube source, wherein individual substrates, with a curved substrate surface directed toward the sputtering source, are able to be moved past said source in a translational manner. The sputtering source is fastened to a chamber wall within a vacuum chamber so as to have two degrees of freedom such that the sputtering source is able to be set both in terms of its spacing to a surface to be coated of a substrate, which is moved past in front of said sputtering source in a translational manner, and with respect to the surface normal of the surface to be coated proceeding from a fixed point such that the surface normal deviation is 0° at all times.


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