The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Jan. 10, 2020
Zhejiang University, Hangzhou, CN;
Jinwei Fang, Hangzhou, CN;
Yingwu Luo, Hangzhou, CN;
Xiang Gao, Hangzhou, CN;
Bogeng Li, Hangzhou, CN;
ZHEJIANG UNIVERSITY, Hangzhou, CN;
Abstract
The present invention discloses a multiblock copolymer with narrow molecular weight distribution and a preparation method therefor. According to the present disclosure, a series of multiblock copolymers with narrow molecular weight distribution are prepared by adopting a reversible addition chain transfer free radical polymerization technology in an emulsion polymerization system by controlling the feeding sequence of monomers. The molecular weight of the series of multiblock copolymers meets theoretical expectations, the content of dead polymers is low, and the mechanical properties are greatly improved compared with the traditional triblock copolymers. The present disclosure has the advantages of simple flow equipment, an energy-saving and environment-friendly process, cheap and readily available raw materials, achieves high control of the block number, block types, block molecular weight and other structures in the block polymers, and provides a universal and feasible means for preparing polymer materials with specific structures and functions.