The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2024

Filed:

Jul. 25, 2022
Applicant:

Shanghai United Imaging Healthcare Co., Ltd., Shanghai, CN;

Inventors:

Jian Liu, Shanghai, CN;

Yuelin Shao, Shanghai, CN;

Xiao Fang, Shanghai, CN;

Cheng Ni, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/10 (2006.01); A61B 6/03 (2006.01);
U.S. Cl.
CPC ...
A61N 5/1067 (2013.01); A61N 5/1071 (2013.01); A61N 5/1081 (2013.01); A61B 6/032 (2013.01); A61B 6/4283 (2013.01); A61N 2005/1061 (2013.01);
Abstract

The present disclosure relates to a radiation system. The system may include a treatment assembly, an imaging assembly, a first gantry, and a second gantry. The treatment assembly may include a first radiation source configured to deliver a treatment beam and have a treatment region. The first gantry may be configured to support the first radiation source. The imaging assembly may include a second radiation source and a radiation detector. The second radiation source may be configured to deliver an imaging beam and the radiation detector may be configured to detect at least a portion of the imaging beam. The imaging assembly may have an imaging region. The second gantry may be configured to support the second radiation source and the radiation detector, wherein the second radiation source is located within the second gantry. The treatment region and the imaging region at least partially overlap.


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