The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Feb. 25, 2022
Applicant:
Metox Technologies, Inc., Houston, TX (US);
Inventors:
Shahab Khandan, Houston, TX (US);
Nagaraja Shashidhar, Houston, TX (US);
Mikhail Novozhilov, Houston, TX (US);
Assignee:
MetOx International, Inc., Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01); H10N 60/01 (2023.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
H10N 60/0464 (2023.02); C23C 16/458 (2013.01); C23C 16/4586 (2013.01); C23C 16/45565 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); C23C 16/545 (2013.01);
Abstract
A vapor deposition reactor apparatus, systems and methods for deposition of thin films, particularly high-temperature superconducting (HTS) coated conductors, utilize multi-sided susceptors and susceptor pairs for increased production throughput. The reactors may also be configured in multi-stack arrangements of the susceptors within a single reactor chamber for additional throughput gains.