The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Jul. 03, 2019
Applicant:

University of Kansas, Lawrence, KS (US);

Inventors:

Judy Z. Wu, Lawrence, KS (US);

Qingfeng Liu, Nanjing, CN;

Assignee:

University of Kansas, Lawrence, KS (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0216 (2014.01); C23C 16/448 (2006.01); G01N 21/65 (2006.01); H01L 31/0232 (2014.01); H01L 31/0236 (2006.01); H01L 31/028 (2006.01); H01L 31/18 (2006.01); C23C 16/18 (2006.01); C23C 16/26 (2006.01); C23C 16/52 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01L 31/02161 (2013.01); C23C 16/18 (2013.01); C23C 16/26 (2013.01); C23C 16/448 (2013.01); C23C 16/52 (2013.01); G01N 21/658 (2013.01); H01L 31/028 (2013.01); H01L 31/0232 (2013.01); H01L 31/02363 (2013.01); H01L 31/18 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

A method of making a plasmonic metal/graphene heterostructure comprises heating an organometallic complex precursor comprising a metal at a first temperature Tfor a first period of time tto deposit a layer of the metal on a surface of a heated substrate, the heated substrate in fluid communication with the precursor; and heating, in situ, the precursor at a second temperature Tfor a second period of time tto simultaneously form on the layer of the metal, a monolayer of graphene and a plurality of carbon-encapsulated metal nanostructures comprising the metal, thereby providing the plasmonic metal/graphene heterostructure. The heated substrate is characterized by a third temperature T. The plasmonic metal/graphene heterostructures, devices incorporating the heterostructures, and methods of using the heterostructures are also provided.


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