The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Jul. 07, 2021
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Hajime Fujikura, Hitachi, JP;

Taichiro Konno, Hitachi, JP;

Takeshi Kimura, Hitachi, JP;

Osamu Goto, Hitachi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 31/0256 (2006.01); H01L 29/205 (2006.01); H01L 29/207 (2006.01); H01L 21/02 (2006.01); H01L 29/778 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/205 (2013.01); H01L 21/0254 (2013.01); H01L 21/02458 (2013.01); H01L 21/02664 (2013.01); H01L 29/207 (2013.01); H01L 21/0242 (2013.01); H01L 21/02378 (2013.01); H01L 21/02598 (2013.01); H01L 29/2003 (2013.01); H01L 29/7786 (2013.01);
Abstract

Provided is a group III nitride laminate for improving device characteristics, including: an underlying substrate; a first layer that is formed on the underlying substrate and is made of aluminum nitride; and a second layer that is formed on the first layer and is made of gallium nitride, wherein the first layer has a thickness of more than 100 nm and 1 μm or less, a full width at half maximum of (0002) diffraction determined through X-ray rocking curve analysis is 250 seconds or less, and a full width at half maximum of (10-12) diffraction determined through X-ray rocking curve analysis is 500 seconds or less.


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