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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11908733 B1

PDFFull Text
Date of Patent:
Feb. 20, 2024

Filed:

May. 10, 2022

Substrate processing method and device manufactured by using the same

Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventor:

Yoon Ki Min, Seoul, KR;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:

Snell & Wilmer L.L.P.

Primary Examiner:

Mark V Prenty

Int. Cl.
CPC ...
H01L 27/11578 (2017.01); H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 23/528 (2006.01); H01L 21/311 (2006.01); H10B 41/27 (2023.01); H10B 41/35 (2023.01); H10B 43/27 (2023.01); H10B 43/35 (2023.01);
U.S. Cl.
CPC ...
H01L 21/76826 (2013.01); H01L 21/31111 (2013.01); H01L 21/76816 (2013.01); H01L 21/76877 (2013.01); H01L 23/5226 (2013.01); H01L 23/5283 (2013.01); H10B 41/27 (2023.02); H10B 41/35 (2023.02); H10B 43/27 (2023.02); H10B 43/35 (2023.02);
Abstract

Provided are a substrate processing method and a device manufactured by using the same, which may improve etch selectivity of an insulating layer deposited on a stepped structure. The substrate processing method includes: forming a first layer on a stepped structure having an upper surface, a lower surface, and a side surface connecting the upper surface and the lower surface; weakening at least a portion of the first layer; forming a second layer on the first layer; and performing an isotropic etching process on the first layer and the second layer.

Find Patent Forward Citations

Min, Yoon. (2024). Substrate processing method and device manufactured by using the same (U.S. Patent No. 11908733). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11908733

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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