The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Jul. 08, 2021
Screen Holdings Co., Ltd., Kyoto, JP;
Mao Omori, Kyoto, JP;
Kazuhiko Fuse, Kyoto, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Abstract
Heating treatment is performed on multiple dummy wafers to preheat in-chamber structures including a susceptor and the like prior to the treatment of a semiconductor wafer to be treated. The first few ones of the multiple dummy wafers are heated to a first heating temperature by light irradiation from halogen lamps, and are thereafter irradiated with a flash of light. The subsequent few ones of the multiple dummy wafers are heated to a second heating temperature lower than the first heating temperature by light irradiation from the halogen lamps, and are thereafter irradiated with a flash of light. This stabilizes the temperature of the in-chamber structures in a shorter time with fewer dummy wafers because the dummy wafers are heated to the high temperature and thereafter heated to the low temperature.