The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Jun. 09, 2021
Applicant:

Pinscreen, Inc., Los Angeles, CA (US);

Inventors:

Koki Nagano, Los Angeles, CA (US);

Huiwen Luo, Los Angeles, CA (US);

Zejian Wang, Los Angeles, CA (US);

Jaewoo Seo, Los Angeles, CA (US);

Liwen Hu, Los Angeles, CA (US);

Lingyu Wei, Los Angeles, CA (US);

Hao Li, Los Angeles, CA (US);

Assignee:

Pinscreen, Inc., Los Angeles, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06V 40/16 (2022.01); G06T 5/00 (2006.01);
U.S. Cl.
CPC ...
G06V 40/161 (2022.01); G06T 5/006 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30201 (2013.01);
Abstract

A system, method, and apparatus for generating a normalization of a single two-dimensional image of an unconstrained human face. The system receives the single two-dimensional image of the unconstrained human face, generates an undistorted face based on the unconstrained human face by removing perspective distortion from the unconstrained human face via a perspective undistortion network, generates an evenly lit face based on the undistorted face by normalizing lighting of the undistorted face via a lighting translation network, and generates a frontalized and neutralized expression face based on the evenly lit face via an expression neutralization network.


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