The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Feb. 07, 2020
Applicant:
Hitachi High-tech Science Corporation, Tokyo, JP;
Inventors:
Yoshitomo Nakagawa, Tokyo, JP;
Mitsuto Aso, Tokyo, JP;
Katsumi Suzuki, Tokyo, JP;
Mamoru Okabe, Tokyo, JP;
Masakatsu Hasuda, Kanagawa, JP;
Assignee:
HITACHI HIGH-TECH SCIENCE CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/74 (2012.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
G03F 1/74 (2013.01); H01J 37/3178 (2013.01);
Abstract
Disclosed is a mask defect repair apparatus that is capable of performing defect repair with high accuracy without exposure of a mask to air while being moved between the mask defect repair apparatus and an inspection device. The mask defect repair apparatus emits charged particle beams with an amount of irradiation therewith which is corrected by a correction unit while supplying gas to a defect of the mask, thereby forming a deposition film.