The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Mar. 18, 2022
Soochow University, Suzhou, CN;
Xinhua Chen, Suzhou, CN;
Yueping Lu, Suzhou, CN;
Zhicheng Zhao, Suzhou, CN;
Qiao Pan, Suzhou, CN;
Weimin Shen, Suzhou, CN;
SOOCHOW UNIVERSITY, Suzhou, CN;
Abstract
The invention provides a wide-aperture spherical primary mirror off-axis afocal optical system, including a primary mirror, a secondary mirror and an aberration compensation mirror group. The primary mirror is a spherical reflector, the secondary mirror are higher-order aspherical reflectors. The primary mirror and the secondary mirror form an off-axis two-mirror system to compress the beam aperture. The aberration compensation mirror group is a coaxial reflective system that is used off-axis. The aberration compensation mirror group has focal power to produce compensation aberrations. The incident beam passes through and is reflected by the primary mirror and secondary mirror sequentially and enters the aberration compensation mirror group thereafter. A spherical reflector is used as the primary mirror, which significantly reduces the development and manufacture cost of the system, and an aberration compensation mirror group is used off-axis to correct residual aberration in the system, which effectively improves imaging quality of the system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile