The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Jul. 06, 2020
Massachusetts Institute of Technology, Cambridge, MA (US);
Nano Analytik Gmbh, Llmenau, DE;
Synfuels Americas Corporation, Sterling, VA (US);
Fangzhou Xia, Cambridge, MA (US);
Chen Yang, Cambridge, MA (US);
Yi Wang, Cambridge, MA (US);
Kamal Youcef-Toumi, Cambridge, MA (US);
Christoph Reuter, Llmenau, DE;
Tzvetan Ivanov, Llmenau, DE;
Mathias Holz, Llmenau, DE;
Ivo Rangelow, Baunatal, DE;
Massachusetts Institute of Technology, Cambridge, MA (US);
Nano Analytik GMBH, LImenau, DE;
Synsfuels Americas Corporation, Sterling, VA (US);
Abstract
Active cantilever probes having a thin coating incorporated into their design are disclosed. The probes can be operated in opaque and/or chemically harsh environments without the need of a light source or optical system and without being significantly negatively impacted by corrosion. The probes include a substrate that has a cantilever, a thermomechanical actuator associated with the cantilever, a piezoresistive stress sensor disposed on the cantilever, and a thin coating disposed on the cantilever and the piezoresistive stress sensor. The coating is bonded to the substrate, is thermally conductive, and has a low thermal resistance. Further, the thin coating is configured to have little to no impact on one or more of a mass of the active probe, a residual stress of the cantilever, or a stiffness of the active probe. Techniques for performing topography and making other measurements in an opaque and/or chemically harsh environment are also provided.