The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Aug. 21, 2020
Applicant:

Anton Paar Gmbh, Graz, AT;

Inventors:

Josef Gautsch, Graz, AT;

Roman Prischnegg, Mooskirchen, AT;

Assignee:

ANTON PAAR GMBH, Graz, AT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/20016 (2018.01); G01N 23/207 (2018.01); G21K 1/02 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G01N 23/20016 (2013.01); G01N 23/207 (2013.01); G21K 1/02 (2013.01); G21K 1/06 (2013.01);
Abstract

An X-ray beam generating system including an X-ray source for generating an original primary X-ray beam, an optics system including a first optics component and at least one second optics component which are movable relative to the X-ray source in order either to bring the first optics component into interaction with the original primary X-ray beam, whereupon a first primary X-ray beam is generated which is deflected at a first deflection angle, or to bring the second optics component into interaction with the original primary X-ray beam, whereupon a second primary X-ray beam is generated which is deflected at a second deflection angle, and a rotating device to rotate the X-ray beam generating system through either a first rotation angle or a second rotation angle to allow either the first primary X-ray beam or the second primary X-ray beam to impinge on a sample region.


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