The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
May. 28, 2021
Emagin Corporation, Hopewell Junction, NY (US);
Evan P. Donoghue, Hopewell Junction, NY (US);
Fridrich Vazan, Pittsford, NY (US);
Kerry Tice, Hopewell Junction, NY (US);
Ilyas I. Khayrullin, Hopewell Junction, NY (US);
Tariq Ali, Hopewell Junction, NY (US);
Qi Wang, Hopewell Junction, NY (US);
Laurie Sziklas, Hopewell Junction, NY (US);
Amalkumar P. Ghosh, Hopewell Junction, NY (US);
eMagin Corporation, Hopewell Junction, NY (US);
Abstract
The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.