The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Jun. 12, 2020
Applicant:

Auburn University, Auburn, AL (US);

Inventors:

Masoud Mahjouri-Samani, Auburn, AL (US);

Nima Shamsaei, Auburn, AL (US);

Assignee:

AUBURN UNIVERSITY, Auburn, AL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/22 (2006.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B23K 26/14 (2014.01); B23K 26/144 (2014.01); B23K 26/36 (2014.01); B28B 1/00 (2006.01); B22F 10/25 (2021.01); B22F 12/53 (2021.01); B22F 12/70 (2021.01); B22F 10/34 (2021.01); B23K 103/00 (2006.01); B22F 12/44 (2021.01); B22F 12/90 (2021.01);
U.S. Cl.
CPC ...
C23C 14/228 (2013.01); B22F 10/25 (2021.01); B22F 10/34 (2021.01); B22F 12/53 (2021.01); B22F 12/70 (2021.01); B23K 26/144 (2015.10); B23K 26/1437 (2015.10); B23K 26/1464 (2013.01); B23K 26/1482 (2013.01); B23K 26/36 (2013.01); B28B 1/001 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B22F 12/44 (2021.01); B22F 12/90 (2021.01); B23K 2103/50 (2018.08);
Abstract

A device including a chamber and a nozzle detachably connected to the chamber, the nozzle defining an aperture, a target carousel disposed within the chamber, a first laser configured to generate a first beam directed toward the target carousel to perform in-situ ablation to form a laser plume, a gas flow system configured to supply gas into the chamber, such that the gas interacts with the laser plume and causes condensation and formation of nanoparticles, and a second laser configured to generate a second beam directed through the interior of the chamber, through the aperture of the nozzle, and toward a substrate disposed outside the device, the second laser beam configured to sinter and crystalize on the substrate the nanoparticles exiting the nozzle.


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